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Dawn at the OASISPublication: DAC Knowledge Center January 5, 2011 -- As we approach terabyte data volumes for IC designs at the 32/28 nm node, the de facto standard file formats, especially GDSII, are starting to look worn. Foundries have widely adopted a new standard, OASIS, for the post- tape-out flow and report at least a 10X file compression improvement. However, for 45-nm designs in 2009 there was still very little use of OASIS as a stream-out format from the design house to the foundry, or from the foundry to the mask house. Considering the data-volume crisis emerging at 32/28nm, OASIS will gain traction for tape-out. This article looks at the adoption trends by manufacturing steps —: e.g., design, post-tape-out flow and mask manufacturing — and explains the factors influencing OASIS adoption.
By Joseph Davis. (Davis is Mentor Graphics Corp.'s Product Manager for Calibre interactive and integration products.) | |
Reprinted from SOCcentral.com, your first stop for ASIC, FPGA, EDA, and IP news and design information. | |