Dawn at the OASIS
Publication: DAC Knowledge Center
January 5, 2011 -- As we approach terabyte data volumes for IC designs at the 32/28 nm node, the de facto standard file formats, especially GDSII, are starting to look worn. Foundries have widely adopted a new standard, OASIS, for the post- tape-out flow and report at least a 10X file compression improvement. However, for 45-nm designs in 2009 there was still very little use of OASIS as a stream-out format from the design house to the foundry, or from the foundry to the mask house. Considering the data-volume crisis emerging at 32/28nm, OASIS will gain traction for tape-out.
This article looks at the adoption trends by manufacturing steps —: e.g., design, post-tape-out flow and mask manufacturing — and explains the factors influencing OASIS adoption.
By Joseph Davis. (Davis is Mentor Graphics Corp.'s Product Manager for Calibre interactive and integration products.)
Reprinted from SOCcentral.com, your first stop for ASIC, FPGA, EDA, and IP news and design information.