January 24, 2005 -- SEMATECH Knowledge Series 2005 (SKS 2005), a collection of single-focus industry meetings designed to increase global knowledge in key areas of semiconductor R&D, was announced by SEMATECH President and CEO Mike Polcari. SKS 2005 includes a sequence of professional conferences, symposia, workshops and meetings in a broad range of areas, including lithography, materials, manufacturing methods, supply chain issues, and effective modeling and business practices. These activities, fully or substantially sponsored by SEMATECH or the International SEMATECH Manufacturing Initiative (ISMI), reflect both consortia's ability to bring together leading technical experts to address critical industry issues.
"SEMATECH and ISMI recognize their responsibilities to provide industry stewardship and enhance global cooperation, which in turn helps bring about a more stable infrastructure that benefits our member companies," Polcari said. "This year we have at least 11 SKS meetings planned, and we may add more as industry and member needs require."
Inaugurated in 2004, SKS consists of ongoing meetings as well as limited-period or non-repeating events. SKS gatherings in 2005 include the following:
Semiconductor Logistics Forum (SLF), February 2-3 at SEMATECH in Austin, TX. The SLF meets three to four times a year to improve the competitiveness of SEMATECH members and the semiconductor industry by developing, promoting, and implementing innovative, better, faster, and cheaper global logistics solutions. Projects and services include an ongoing benchmark study on logistics data, a two-day SLF Symposium, information-sharing on logistical methods, supplier reviews, lobbying of regulatory actions and promoting industry standards. Contact: Marty Brown, (512) 356-3079.
Resist Limitations Workshop and Resist Line Edge Roughness (LER) Workshop, February 27 at Crowne Plaza Hotel in San Jose. Both meetings aim to help participants understand the current status of LER and resist limitations research in the IC industry, identify what knowledge is lacking, and generate ideas for future projects and activities throughout the industry. Resist Limitations contact: Kim Dean, email@example.com or (512) 356-3275. LER contact: Karen Turnquest, (512) 356-3394.
EUV Source Workshop, February 27 at San Jose Convention Center, San Jose, CA. This meeting will review critical challenges, performance updates and technology developments related to extreme ultraviolet (EUV) lithography sources. Contact: Vivek Bakshi, (512) 356-7528.
Conference on Emerging Technologies in Semiconductor Surface Preparation, April 19-20 at Hilton Airport Hotel in Austin, TX.: This conference will address issues, challenges and emerging solutions in wafer surface preparation and cleaning technology in front-end and back end processes. The meeting also will encompass advanced litho mask cleaning and defect reduction and environment/safety/health issues in semiconductor cleaning. Contact: Naim Moumen, or (512) 356-7893.
Immersion Symposium, Sept. 12-15 in Brugge, Belgium. Fifth in an ongoing series of immersion meetings, this symposium will continue to guide semiconductor manufacturers and suppliers on progress in 193 nm immersion lithography, and to build consensus of emerging critical issues. SEMATECH and Selete are co-sponsors, with IMEC as primary sponsor. SEMATECH contact: Andrew Grenville, (781) 981-0826.
AEC/APC Symposium XVII, Sept. 24 -29 at the Renaissance Esmeralda Hotel in Indian Wells, CA. This symposium, part of a series of such meetings held three times a year (North America, Europe, Asia), brings together IC manufacturers and suppliers in an effort to accelerate the move toward more efficient and more intelligent manufacturing through data- driven and automated decision making. Contact: Brad Van Eck, (512) 356-3981.
4th International EUVL Symposium, Nov. 7 at Paradise Point Resort in San Diego, CA. This meeting is part of SEMATECH's commitment to help develop the technology and infrastructure for EUV lithography -- including sources, metrology, optics contamination control, and mask blanks. Contact: Kevin Kemp, (512) 356-7593.
2005 SEMATECH VIP Reception, to be held in conjunction with SEMICON West July 12-14, in San Francisco. Again this year, SEMATECH will put together its top executives and technology experts with media and business representatives to discuss the consortium's initiatives and technical achievements. Meeting is invitation-only. Contact Dan McGowan, 512-356-3440.
2nd ISMI Symposium on Manufacturing Effectiveness, tentatively scheduled for October in Austin. Following its successful introduction last year, this annual symposium hosted by ISMI will focus on reducing manufacturing costs through advances in equipment, processes, resources, fab design, and manufacturing methods both in existing and next-generation factories. Contact Brad Van Eck, (512) 356-3981; or Mike Schwartz, (512) 356-3926.
Global Economic Symposium (GES) XV, being held in conjunction with the 2nd ISMI Manufacturing Effectiveness Symposium. As part of an ongoing series featuring the SEMATECH Industry Economic Model (IEM), the GES engages industry professional representing chipmakers, equipment/material suppliers, universities and governments on strategic semiconductor business and productivity matters. Contact: Denis Fandel, (512) 356-3461.
Go to the SEMATECH, Inc. website to find additional information.