June 4, 2012 -- Mentor Graphics Corp. today announced that its Calibre physical verification platform is available for TSMC's 20-nm manufacturing process. TSMC has given Phase I Certification to Mentor's Calibre, certifying it for TSMC design rule manuals (DRMs) and Spice models. Current certifications address elements of the Calibre platform including innovative patterning, DRC, LVS and extraction.
"The 20nm node raises new design and verification challenges," said Joseph Sawicki, Vice President and General Manager of the Design-to-Silicon division at Mentor Graphics. "The interdependence of design and manufacturing is greater than ever. Mentor will continue collaborating with TSMC to help ensure a successful market transition to 20 nanometers and beyond."
The Calibre platform for 20-nm includes pattern matching facilities for advanced design rule definition and litho hotspot pre-filtering. It also includes the advanced fill capabilities of Calibre SmartFill, which supports multi-layer fill shapes and user-defined fill cells that are automatically inserted into a layout based on analysis of the design.